There are still some problems to work out, such as cutting defect rates, but directed self-assembly has the potential to reduce the total number of masks. The upcoming 7nm process node presents tough ...

This guide on 50 DSA patterns helps you recognize common problem types and apply proven approaches to solve coding questions ...

(Nanowerk News) Advanced simulation models and a computational framework for lithography-integrated directed self-assembly (DSA) of block copolymers will be developed within the European project ...

In the creative, or desperate, rush to find ways to pattern 10 nm node using double patterning immersion 193nm lithography, a designer from ARM is left “crying in his beer” at the consequent design ...

Imec and Tokyo Electron (TEL) announce that they will accelerate their Directed Self-Assembly (DSA) activities at imec’s recent 300mm fab-compatible DSA process line. Over the past two years, both ...

(Nanowerk News) Imec and Tokyo Electron (TEL) announce that they will accelerate their Directed Self-Assembly (DSA) activities at imec’s recent 300 mm fab-compatible DSA process line. Over the past ...

A recently developed block copolymer could help push the limits of integration and miniaturization in semiconductor manufacturing, report scientists in Tokyo Tech and TOK. Chemically tailored for ...

A new paper claims that directed self-assembly could be key to patterning lines below 10nm, but line-edge roughness and manufacturing challenges still present substantial barriers. Share on Facebook ...