After more than a decade of research and development, Tokyo Electron Miyagi Ltd. has introduced an innovative semiconductor ...

As chip designs push the limits of speed, size and complexity, the semiconductor industry has set its sights on angstrom-scale device features. High-speed, precise and repeatable plasma power delivery ...

A large-scale (4-inch), highly uniform, and defect-free plasma etching technology, which will likely become the foundation of the industrial supply of molybdenum disulfide (MoS₂), a next-generation ...

A research team has successfully developed a new technology to control doping at the nucleus (seed) phase to increase the performance of semiconductor nanocrystals. The study uncovered how the doping ...

Researchers from Ulsan National Institute of Science and Technology (UNIST), Pohang University of Science and Technology (POSTECH), and Seoul National University of Science and Technology developed a ...

(Nanowerk News) Professor Jiwoong Yang and his research team at the Department of Energy Science and Engineering, Daegu Gyeongbuk Institute of Science & Technology (DGIST; President Kunwoo Lee) ...

A study revealed that a simple thermal reaction of gallium nitride with metallic magnesium results in the formation of a distinctive superlattice structure. This represents the first time researchers ...

Doping in semiconductors is adding a small amount of impurities into a very pure semiconductor material. It might sound strange to add impurities on purpose, but this is a critical to make ...